Company Filing History:
Years Active: 2022-2024
Title: Brett Avedisian: Innovator in Ion Beam Technology
Introduction
Brett Avedisian is a notable inventor based in St. Helens, OR (US). He has made significant contributions to the field of ion beam technology, particularly in the area of sample preparation for multilayer materials. With a total of 2 patents, Avedisian's work has advanced the capabilities of etching processes in various applications.
Latest Patents
Avedisian's latest patents focus on "Perimeter trench formation and delineation etch delayering." These patents disclose apparatus and methods suitable for both online and offline use with multilayer samples. The technology leverages ion beam techniques to provide rapid and accurate delayering, with etch stops at a succession of target layers. In one aspect, a trench is milled around a region of interest (ROI), and a conductive coating is developed on the inner sidewall. This innovation ensures reliable conducting paths between intermediate layers within the ROI and a base layer, while eliminating stray current paths extending outside the ROI. As a result, better quality etch progress monitoring is achieved during subsequent etching processes. The use of ion beam assisted gas etching allows for rapid delayering with etch stops at target polysilicon layers, enabling uniform etching at deep layers.
Career Highlights
Brett Avedisian is currently employed at FEI Company, where he continues to develop and refine his innovative technologies. His work has positioned him as a key player in the field of ion beam technology, contributing to advancements that enhance the efficiency and accuracy of etching processes.
Collaborations
Avedisian collaborates with talented individuals such as James S Clarke and Micah LeDoux. These partnerships foster a creative environment that drives innovation and leads to the development of cutting-edge technologies.
Conclusion
Brett Avedisian's contributions to ion beam technology and his innovative patents demonstrate his commitment to advancing the field of sample preparation. His work not only enhances the quality of etching processes but also sets a foundation for future innovations in multilayer material applications.