Leuven, Belgium

Brendan Marozas

This inventor holds 1 USPTO granted patent and 4 published patent applications. Top assignee: Asm IP Holding B.v.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Brendan Marozas. Retrieved from https://idiyas.com/inventor/brendan-marozas

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Brendan Marozas - Innovator in Gas Injection Systems

Introduction

Brendan Marozas is an inventor based in Leuven, Belgium. He is known for his work in the field of gas injection systems and semiconductor processing. Although he currently holds no granted patents, his innovative ideas are reflected in his latest patent applications.

Latest Patent Applications

Brendan Marozas has submitted several notable patent applications. One of his applications is titled "GAS INJECTION SYSTEMS FOR SUPPLYING GAS INTO A REACTION CHAMBER AND SEMICONDUCTOR PROCESSING SYSTEM INCLUDING GAS INJECTION SYSTEMS." This application discloses gas injection systems that include an injector housing with a first series of injection ports and a separate second series of injection ports. These designs are constructed to reduce parasitic deposition on the inner surfaces of a reaction chamber. Additionally, methods for forming silicon-containing layers within a reaction chamber with reduced parasitic deposition are also disclosed.

Another significant application is "METHODS FOR DEPOSITING A BORON DOPED SILICON GERMANIUM LAYER AND ASSOCIATED COMPOSITIONS." This application outlines methods for depositing boron-doped silicon germanium layers using a thermal deposition process that employs a composition including an iodosilane precursor. The methods also encompass selective deposition processes for these layers.

Conclusion

Brendan Marozas is an innovative inventor whose work focuses on advancing gas injection systems and semiconductor processing technologies. His latest patent applications demonstrate his commitment to reducing parasitic deposition and improving material deposition methods.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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