Albany, NY, United States of America

Brandon Byrns

USPTO Granted Patents = 1 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: Brandon Byrns: Innovator in Atmospheric Plasma Processing

Introduction

Brandon Byrns is a notable inventor based in Albany, NY (US). He has made significant contributions to the field of microelectronics through his innovative patent in atmospheric plasma processing systems. His work focuses on enhancing the manufacturing processes of microelectronic workpieces, particularly semiconductor wafers.

Latest Patents

Brandon Byrns holds a patent titled "Atmospheric plasma processing systems and methods for manufacture of microelectronic workpieces." This patent describes systems and methods for atmospheric plasma processing, where a radio frequency (RF) generator produces an RF signal that is distributed to plasma sources within a process chamber. The chamber operates at atmospheric pressure between 350 to 4000 Torr. The plasma sources are designed to be scanned across microelectronic workpieces, applying plasma gases generated by the plasma generators. The scanning operation can involve linear and/or angular movement of the plasma sources and the workpieces, allowing for versatile applications in manufacturing.

Career Highlights

Brandon Byrns has established himself as a key figure in the field of microelectronics. His innovative approach to atmospheric plasma processing has the potential to revolutionize the manufacturing of semiconductor devices. He is currently associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry.

Collaborations

Brandon has collaborated with notable professionals in his field, including Anton J deVillers and Mirko Vukovic. These collaborations have likely contributed to the advancement of his research and the successful development of his patented technologies.

Conclusion

Brandon Byrns is a pioneering inventor whose work in atmospheric plasma processing is shaping the future of microelectronics manufacturing. His contributions are essential for the advancement of semiconductor technology, and his patent reflects his innovative spirit and dedication to the field.

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