This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: American Air Liquide, Inc.. Active years: 2025.
Company Filing History:
Years Active: 2025
Title: The Innovations of Bradley McKEOWN
Introduction
Bradley McKEOWN is an accomplished inventor based in Wilmington, DE (US). He has made significant contributions to the field of vapor deposition technologies, particularly through his innovative work on indium precursors.
Latest Patents
Bradley McKEOWN holds a patent for "Indium precursors for vapor depositions." This patent discloses indium (In)-containing film-forming compositions that comprise In(III)-containing precursors with halogens. The methods outlined in the patent detail the synthesis of these precursors and their application in depositing indium-containing films and alloys. The precursors include chlorine with nitrogen-based ligands, specifically featuring 1 or 2 amidinate ligands, 1 or 2 iminopyrrolidinate ligands, 1 or 2 amido amino alkane ligands, 1 or 2 μ-diketiminate ligands, or a silyl amine ligand. These innovations are particularly suitable for vapor phase depositions, such as atomic layer deposition (ALD) and chemical vapor deposition (CVD).
Career Highlights
Bradley McKEOWN is currently employed at American Air Liquide, Inc., where he continues to advance his research and development efforts in the field of vapor deposition technologies. His work has positioned him as a key player in the industry, contributing to the development of advanced materials.
Collaborations
Some of his notable coworkers include Kayla Diemoz and Claudia Fafard, who collaborate with him on various projects within the company.
Conclusion
Bradley McKEOWN's innovative work in the field of indium precursors for vapor depositions showcases his expertise and commitment to advancing technology. His contributions are significant in the realm of material science and vapor deposition techniques.