Boui Ikeda

Title: Boui Ikeda: Innovator in Substrate Processing Technology

Introduction

Boui Ikeda is a notable inventor based in Koshi, Japan. She has made significant contributions to the field of substrate processing technology. Her innovative work has led to the development of a unique patent that enhances the efficiency of substrate processing.

Latest Patents

Boui Ikeda holds a patent for a substrate processing apparatus and method. This invention includes a substrate holder designed to hold a substrate with a concavo-convex pattern oriented upward. The apparatus features a liquid supply unit that supplies a processing liquid to form a liquid film in the concave portions of the pattern. Additionally, it includes a heating unit that irradiates the substrate or the liquid film with a laser beam for effective heating. The heating controller is responsible for controlling the heating unit to ensure that the entire concave portion is exposed in a depth direction from the processing liquid.

Career Highlights

Boui Ikeda is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. Her work at this organization has allowed her to apply her innovative ideas in a practical setting, contributing to advancements in substrate processing technology.

Collaborations

Boui has collaborated with notable colleagues, including Shoichiro Hidaka and Eiichi Sekimoto. These collaborations have fostered a creative environment that encourages innovation and the development of cutting-edge technologies.

Conclusion

Boui Ikeda's contributions to substrate processing technology exemplify her innovative spirit and dedication to advancing the field. Her patent reflects her expertise and commitment to improving processing methods, making her a valuable asset in the industry.