Goyang, South Korea

Bora Yoon

This inventor holds 1 USPTO granted patent. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2025.


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Bora Yoon: Innovator in Plasma Processing Technology

Introduction

Bora Yoon is a prominent inventor based in Goyang-si, South Korea. He has made significant contributions to the field of semiconductor manufacturing through his innovative designs and technologies. His work is particularly focused on plasma processing apparatuses, which are essential in the production of semiconductor devices.

Latest Patents

Bora Yoon holds a patent for a "Plasma processing apparatus and semiconductor device manufacturing method." This invention includes a chamber with an upper wall featuring multiple through holes and a lower wall with an exhaust hole, defining a plasma processing space. The apparatus also comprises a substrate stage with a seating surface for a substrate, a baffle plate with gas distribution holes, a gas supply system, a pumping device for pressure control, and a plasma generator for creating plasma using supplied gas.

Career Highlights

Bora Yoon is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics and semiconductor industry. His role involves developing advanced technologies that enhance semiconductor manufacturing processes. His innovative approach has positioned him as a key figure in his field.

Collaborations

Bora Yoon has collaborated with notable colleagues, including Wonsuk Yang and Sanghun Seo. These collaborations have fostered a creative environment that encourages the development of cutting-edge technologies in semiconductor manufacturing.

Conclusion

Bora Yoon's contributions to plasma processing technology and semiconductor manufacturing highlight his role as an influential inventor. His patent and work at Samsung Electronics Co., Ltd. demonstrate his commitment to advancing the field.

Profile summary based on public USPTO records.
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