Bor-Shiun Wu

Title: Innovations of Bor-Shiun Wu in Metal Antireflection Coating Technology

Introduction

Bor-Shiun Wu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of metal antireflection coatings. His innovative approach has led to advancements that enhance the quality monitoring of these coatings.

Latest Patents

Bor-Shiun Wu holds a patent for a "Monitor method for quality of metal ARC (antireflection coating) layer." This invention relates to a fast and accurate method for monitoring the quality of metal ARC layers. The method involves immersing a silicon wafer with an ARC layer into an acidic or alkalescent solution for approximately 200-300 seconds. This process allows for the detection of defects in the metal ARC layer due to a Galvanic cell effect, which can be quantified using a wafer defect inspector, such as a KLA instrument. This innovative approach enables efficient quality monitoring directly from the production line.

Career Highlights

Bor-Shiun Wu is associated with Mosel Vitelic Corporation, where he has applied his expertise in semiconductor manufacturing. His work has been instrumental in improving the production processes and ensuring the quality of semiconductor components.

Collaborations

Throughout his career, Bor-Shiun Wu has collaborated with esteemed colleagues, including Chou-Shin Jou and Tsai-Sen Lin. These collaborations have fostered a productive environment for innovation and development in their field.

Conclusion

Bor-Shiun Wu's contributions to the field of metal antireflection coatings exemplify the importance of innovation in semiconductor technology. His patented method for quality monitoring represents a significant advancement that benefits the industry.