This inventor holds 1 USPTO granted patent. Top assignee: Applied Materials, Inc.. Active years: 2019.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2019
Title: Bopanna Vasanth: Inventor in Substrate Processing Technology
Introduction
Bopanna Vasanth is an inventor based in Bengaluru, India, and works at Applied Materials, Inc. His patent work focuses on equipment for substrate processing.
Latest Patents
Vasanth is associated with 1 patent, titled “Thermal Radiation Barrier for Substrate Processing Chamber Components.” The invention describes a substrate support heater designed to reduce energy losses. It includes a heater body with a surface that receives a substrate, an opposing surface, and a heating element positioned between them. A thermal barrier on the opposing surface comprises two layers.
Career Highlights
Vasanth’s listed invention addresses thermal management in substrate processing chamber components. Its layered barrier is designed to limit heat loss from the substrate support heater.
Collaborations
Vasanth’s listed coworkers include Ashish Bhatnagar and Govinda Raj. The patent reflects work in the broader field of substrate processing equipment at Applied Materials, Inc.
Conclusion
Bopanna Vasanth’s patent contribution centers on a layered thermal barrier intended to improve energy retention in substrate processing chamber components.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile