Beijing, China

Bongkwan Jung

This inventor holds 2 USPTO granted patents. Top assignee: Boe Technology Group Co., Ltd.. Active years: 2019-2020.


% Patents Active = 50.0

Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2019-2020

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2 patents (USPTO):Explore Patents

Title: Bongkwan Jung: Innovator in Display Technology

Introduction

Bongkwan Jung is a notable inventor based in Beijing, China. He has made significant contributions to the field of display technology, holding a total of 2 patents. His work focuses on innovative methods for manufacturing components essential for modern display systems.

Latest Patents

Bongkwan Jung's latest patents include a method for manufacturing spacers and a method for manufacturing a display substrate. The method for manufacturing spacers involves an over-development process on a photoresist layer to create distinct photoresist patterns on a substrate. This process includes forming recesses at the outer edges of these patterns, allowing for the flow of photoresist to fill these recesses effectively. Additionally, his patent on the touch display panel outlines a design that incorporates a color filter substrate, an array substrate, and an optical sensor to detect touch operations, enhancing user interaction with display devices.

Career Highlights

Bongkwan Jung is currently employed at BOE Technology Group Co., Ltd., a leading company in the display technology sector. His work at BOE has positioned him as a key player in advancing display manufacturing techniques.

Collaborations

He collaborates with talented coworkers, including Hongjoo Lee and Younjoo Kim, who contribute to the innovative projects at BOE Technology Group.

Conclusion

Bongkwan Jung's contributions to display technology through his patents and work at BOE Technology Group Co., Ltd. highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of display manufacturing.

Profile summary based on public USPTO records.
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