The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 03, 2020

Filed:

Jul. 12, 2017
Applicant:

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Bongkwan Jung, Beijing, CN;

Weijie Wang, Beijing, CN;

Qinghui Zeng, Beijing, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1339 (2006.01); G03F 7/30 (2006.01); G03F 7/40 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G02F 1/1339 (2013.01); G03F 7/30 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); G02F 1/13394 (2013.01); G02F 2001/13396 (2013.01); G02F 2001/13398 (2013.01);
Abstract

A method for manufacturing spacers and a method for manufacturing a display substrate are disclosed. The method for manufacturing spacers includes performing an over-development process on the photoresist layer processed by the exposure process to form a first photoresist pattern and a second photoresist pattern on the substrate; an outer edge of a lower portion of the first photoresist pattern near the substrate is provided with a recess, and an outer edge of a lower portion of the second photoresist pattern near the substrate is provided with a recess; waiting a first duration for photoresist on a surface of the first photoresist pattern to flow downwards to fill the recess of the first photoresist pattern, and photoresist on a surface of the second photoresist pattern to flow downwards to fill the recess of the second photoresist pattern.


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