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Years Active: 2011
Title: Bong-Seok Seo: Innovator in Transistor Technology
Introduction
Bong-Seok Seo is a notable inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the formation of transistors. His innovative approach has led to advancements in complementary metal-oxide semiconductor (CMOS) structures.
Latest Patents
Bong-Seok Seo holds a patent for a method of transistor formation using a capping layer. This method includes depositing a conductive layer over both n-type and p-type field effect transistors, followed by the application of a capping layer. The process involves etching these layers to create a capped gate conductor, which is essential for the effective functioning of the transistors. The patent highlights the ion-implantation technique used to dope the source and drain regions of the transistors without affecting the gate region. He has 1 patent to his name.
Career Highlights
Throughout his career, Bong-Seok Seo has worked with prominent companies in the technology sector. He has been associated with Samsung Electronics Co., Ltd. and IBM, where he contributed to various projects that enhanced semiconductor technologies. His work has been instrumental in pushing the boundaries of what is possible in transistor design and functionality.
Collaborations
Bong-Seok Seo has collaborated with talented individuals in the field, including Jong-Ho Yang and Dong Hee Yu. These collaborations have fostered innovation and have led to the development of cutting-edge technologies in the semiconductor industry.
Conclusion
Bong-Seok Seo's contributions to transistor technology exemplify the spirit of innovation in the semiconductor field. His patent and career achievements reflect his dedication to advancing technology and improving electronic devices.