Bon-Wang Koo

Title: Bon-Wang Koo: Innovator in Photoresist Removal Technology

Introduction

Bon-Wang Koo is a notable inventor based in Yongin, South Korea. He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of photoresist removal. His innovative approach has the potential to enhance the efficiency and effectiveness of pattern formation in various applications.

Latest Patents

Bon-Wang Koo holds a patent for a "Composition for removing photoresist and method of forming a pattern using the same." This patent describes a method where a layer is formed on a substrate, followed by the creation of a photoresist pattern. The method involves etching a portion of the layer exposed by the photoresist pattern, using it as an etching mask. The photoresist pattern is then removed using a specialized composition that includes hydroxylamine, an alkanolamine-based compound, a morpholine-based compound, a polar solvent, a corrosion preventing agent, and water. This composition effectively removes the photoresist pattern and etched residues without damaging the substrate or the pattern, which may include metal, nitride, oxide, and/or metal nitride.

Career Highlights

Bon-Wang Koo is associated with Ram Technology Co., Ltd., where he continues to develop innovative solutions in the semiconductor industry. His work has been instrumental in advancing technologies that improve manufacturing processes and product quality.

Collaborations

He has collaborated with notable colleagues such as Jun-Ing Kil and Sok-Ho Yi, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Bon-Wang Koo's contributions to the field of photoresist removal technology exemplify his commitment to innovation in semiconductor manufacturing. His patent reflects a significant advancement that could lead to improved processes in the industry.