Lyngby, Denmark

Boisen Anja

This inventor holds 1 USPTO granted patent. Top assignee: Atlant 3D Nanosystems Aps. Active years: 2024.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Boisen Anja. Retrieved from https://idiyas.com/inventor/boisen-anja

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2024

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Boisen Anja: Innovator in Atomic Layer Process Printing

Introduction

Boisen Anja is a notable inventor based in Lyngby, Denmark. He has made significant contributions to the field of material deposition through his innovative work on atomic layer process printers. His inventions are paving the way for advancements in various applications that require precision at the atomic level.

Latest Patents

Anja holds a patent for an atomic layer process printer. This invention relates to a printer designed for material deposition, etching, and/or cleaning on an atomic scale in a selective area. The method associated with this printer allows for precise control over material processes, enhancing the capabilities of manufacturing at the nanoscale.

Career Highlights

Anja is currently employed at Atlant 3D Nanosystems ApS, where he continues to develop cutting-edge technologies. His work focuses on advancing the capabilities of atomic layer processing, which is crucial for various high-tech industries.

Collaborations

Anja collaborates with talented individuals such as Maksym Plakhotnyuk and Ole Hansen. Together, they contribute to the innovative environment at Atlant 3D Nanosystems ApS, driving forward the research and development of advanced printing technologies.

Conclusion

Boisen Anja's contributions to atomic layer process printing exemplify the impact of innovative thinking in technology. His work not only enhances manufacturing processes but also opens new avenues for research and application in various fields.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…