The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 2024
Filed:
Jun. 03, 2020
Applicant:
Atlant 3d Nanosystems Aps, Taastrup, DK;
Inventors:
Maksym Plakhotnyuk, Kgs. Lyngby, DK;
Ole Hansen, Hørsholm, DK;
Boisen Anja, Kgs. Lyngby, DK;
Tomas Rindzevicius, Malmó, SE;
Ivan Kundrata, Bratislava, SK;
Karol Fröhlich, Bratislava, SK;
Julien Bachmann, Erlangen, DE;
Assignee:
ATLANT 3D Nanosystems ApS, Taastrup, DK;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B33Y 10/00 (2015.01); B29C 64/159 (2017.01); B29C 64/209 (2017.01); B33Y 30/00 (2015.01); C23C 16/455 (2006.01); C23C 16/56 (2006.01); C23C 16/04 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45544 (2013.01); B29C 64/159 (2017.08); B29C 64/209 (2017.08); B33Y 10/00 (2014.12); B33Y 30/00 (2014.12); C23C 16/45555 (2013.01); C23C 16/56 (2013.01); C23C 16/04 (2013.01); C23C 16/45576 (2013.01);
Abstract
The invention relates to an atomic layer process printer for material deposition, etching and/or cleaning on an atomic scale in a selective area. The invention further relates to a method for material deposition, etching and/or cleaning on an atomic scale in a selective area using the atomic layer process printer.