Bohan Jiang

Title: Bohan Jiang: Innovator in Semiconductor Processing

Introduction

Bohan Jiang is a notable inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor processing, particularly through his innovative patent. His work focuses on improving manufacturing techniques that enhance efficiency and reduce costs.

Latest Patents

Bohan Jiang holds a patent titled "Method for etching back hard mask layer on tops of dummy polysilicon gates in gate last process." This patent describes a method that involves several steps, including the formation of dummy gate structures, the deposition of a spin-on carbon layer, and a two-step etching-back process. This technique not only saves one photomask but also improves the process window, showcasing Jiang's commitment to advancing semiconductor technology.

Career Highlights

Bohan Jiang is currently employed at Shanghai Huali Integrated Circuit Corporation, where he applies his expertise in semiconductor manufacturing. His innovative approach has positioned him as a valuable asset to the company and the industry at large.

Collaborations

Throughout his career, Bohan Jiang has collaborated with talented individuals such as Shidong Fu and Ran Huang. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Bohan Jiang's contributions to semiconductor processing through his patent demonstrate his innovative spirit and dedication to improving manufacturing techniques. His work continues to influence the industry and pave the way for future advancements.