Bo-Shiuan Shie

Title: Bo-Shiuan Shie: Innovator in Semiconductor Technology

Introduction

Bo-Shiuan Shie is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative structures and methods that enhance the performance and efficiency of semiconductor devices.

Latest Patents

One of Bo-Shiuan Shie's latest patents is titled "Structure and formation method of semiconductor device with fin structures." This patent describes a method that includes forming a first semiconductor fin and a second semiconductor fin over a semiconductor substrate, where the second fin is wider than the first. The method also involves creating a gate stack that extends across both fins, along with forming p-type and n-type doped source/drain structures on each fin, respectively. Another patent under his name also addresses the structure and formation method of semiconductor devices with multiple fin structures, detailing the formation of spacer layers and blocking fins to improve device performance.

Career Highlights

Bo-Shiuan Shie is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to push the boundaries of semiconductor technology and contribute to advancements in the field.

Collaborations

Throughout his career, Bo-Shiuan has collaborated with notable colleagues, including Po-Nien Chen and Chih-Yung Lin. These collaborations have fostered a productive environment for innovation and development in semiconductor technologies.

Conclusion

Bo-Shiuan Shie's contributions to semiconductor technology through his patents and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key innovator in the industry. His advancements continue to shape the future of semiconductor devices.