Company Filing History:
Years Active: 2000
Title: Blake E Cherrington: Innovator in Plasma Technology
Introduction
Blake E Cherrington is a notable inventor based in Dayton, OH (US). She has made significant contributions to the field of semiconductor processing through her innovative work. Her expertise and dedication to advancing technology have led to the development of a unique patent.
Latest Patents
Cherrington holds a patent for a "High density plasma source for semiconductor processing." This invention involves an apparatus designed to produce plasma within a vacuum chamber. The high-density plasma source comprises a top layer and a bottom layer that are electrically connected and spaced apart. This design allows for the adjustment of the fields generated by the source, enhancing the uniformity of the plasma. The top and bottom layers are formed by a plurality of conductive loops, showcasing her innovative approach to plasma technology.
Career Highlights
Cherrington is affiliated with the University of Texas System, where she continues to contribute to research and development in her field. Her work has garnered attention for its potential applications in semiconductor manufacturing, which is crucial for modern electronics.
Collaborations
Throughout her career, Cherrington has collaborated with esteemed colleagues, including Marwan H Khater and Lawrence J Overzet. These partnerships have further enriched her research and innovation efforts.
Conclusion
Blake E Cherrington is a pioneering inventor whose work in high-density plasma technology is shaping the future of semiconductor processing. Her contributions are vital to the advancement of the industry, and her innovative spirit continues to inspire others in the field.