The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 22, 2000
Filed:
Nov. 19, 1997
Applicant:
Inventors:
Marwan H Khater, Dallas, TX (US);
Lawrence J Overzet, Plano, TX (US);
Blake E Cherrington, Dayton, OH (US);
Assignee:
Board of Regents, The University of Texas System, Austin, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ; C23C / ;
U.S. Cl.
CPC ...
21912143 ; 21912152 ; 2191214 ; 1187 / ; 156345 ; 31511121 ;
Abstract
An apparatus for producing a plasma (70) within a vacuum chamber (50) comprising a high density plasma source (10) is disclosed wherein the source (10) comprises a top layer (13) and a bottom layer (11) electrically connected to and spaced apart from each other, in a manner to adjust the fields generated by the source (10), hence the uniformity of the plasma (70), wherein the top and bottom layers (13, 11) are formed by a plurality of conductive loops.