Hillsboro, OR, United States of America

Blake Bluestein

This inventor holds 1 USPTO granted patent and 2 published patent applications and 1 EPO patent. Top assignee: Intel Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Blake Bluestein. Retrieved from https://idiyas.com/inventor/blake-bluestein

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations by Blake Bluestein in Integrated Circuit Technology.

Introduction

Blake Bluestein is an accomplished inventor based in Hillsboro, OR (US). He has made significant contributions to the field of integrated circuits, particularly through his innovative patent that enhances the performance of interconnect structures.

Latest Patents

Blake Bluestein holds a patent titled "Interconnect structures with nitrogen-rich dielectric material interfaces for low resistance vias in integrated circuits." This patent describes integrated circuit structures that include an interconnect feature without a higher-resistance liner material. In the absence of a liner, metal of low resistance directly contacts an adjacent dielectric material, enabling lower resistance interconnect. Even for low-k dielectric compositions, the adhesion of the metal to the dielectric material is improved through the incorporation of nitrogen proximal to the interface. Prior to the deposition of the metal upon a surface of the dielectric, the surface is exposed to nitrogen species to form a nitrogen-rich compound at the surface. The metal deposited upon the surface may then be nitrogen-lean, for example, a substantially pure elemental metal or metal alloy.

Career Highlights

Blake Bluestein is currently employed at Intel Corporation, where he continues to push the boundaries of technology in integrated circuits. His work has been instrumental in developing more efficient and effective interconnect structures that are crucial for modern electronic devices.

Collaborations

Blake has collaborated with notable colleagues, including Ming-Yi Shen and Nita Chandrasekhar, who contribute to the innovative environment at Intel Corporation.

Conclusion

Blake Bluestein's contributions to integrated circuit technology through his patent demonstrate his commitment to innovation and excellence in the field. His work not only enhances the performance of electronic devices but also sets a foundation for future advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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