Aalen, Germany

Bjoern Butscher


Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2020

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1 patent (USPTO):Explore Patents

Title: Bjoern Butscher: Innovator in Microlithography Control Systems

Introduction

Bjoern Butscher is a notable inventor based in Aalen, Germany. He has made significant contributions to the field of microlithography, particularly in the development of control systems for projection exposure apparatuses. His innovative work has led to the filing of a patent that showcases his expertise and creativity in this specialized area.

Latest Patents

Bjoern Butscher holds a patent for a "Control apparatus and method for controlling a manipulator in respect of a microlithographic projection exposure apparatus." This patent describes a control apparatus that manages at least one manipulator to modify parameters of a microlithographic projection exposure apparatus. The system generates a target for a travel variable, which defines the necessary modifications to be undertaken via the manipulator. The control apparatus is designed to optimize a merit function based on the state characterization of the projection exposure apparatus. This merit function includes a penalty term that accounts for property limits of the apparatus, ensuring that the function value approaches infinity as the property nears its limit. Bjoern Butscher's patent represents a significant advancement in the efficiency and precision of microlithographic processes.

Career Highlights

Bjoern Butscher is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems and microlithography. His role involves working on cutting-edge technologies that enhance the capabilities of projection exposure systems. His contributions have been instrumental in advancing the company's position in the competitive landscape of microlithography.

Collaborations

Bjoern Butscher collaborates with Christian Wald, a fellow innovator in the field. Together, they work on projects that push the boundaries of technology in microlithography, contributing to the development of more efficient and effective systems.

Conclusion

Bjoern Butscher's work in microlithography control systems exemplifies the spirit of innovation and dedication to advancing technology. His patent and contributions at Carl Zeiss SMT GmbH highlight his role as a key player in this specialized field.

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