The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 2020
Filed:
Jan. 03, 2020
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Bjoern Butscher, Aalen, DE;
Christian Wald, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A control apparatus controls at least one manipulator for modifying a parameter of a microlithographic projection exposure apparatus by generating a target for a travel variable, which defines a modification of the parameter to be undertaken via the manipulator. The control apparatus is configured to generate the target from a state characterization of the projection exposure apparatus by optimizing a merit function. A merit function includes at least one penalty term for taking account of a limit for a property of the projection exposure apparatus as an implicit constraint and the penalty term is formulated in such a way that the function value thereof tends to 'infinity' as the property approaches the limit.