Binjie Lu

Title: Innovations of Binjie Lu in Wavefront Reconstruction

Introduction

Binjie Lu is a prominent inventor based in Hangzhou, China. He has made significant contributions to the field of optical engineering, particularly in wavefront reconstruction and error detection. With a total of 3 patents, his work showcases innovative methods and devices that enhance optical measurement techniques.

Latest Patents

One of his latest patents is titled "Apparatus and method for wavefront reconstruction based on rotationally symmetric extended structured light illumination." This invention provides a comprehensive apparatus that includes a laser device, a neutral density filter, a microscope objective, and several other components arranged sequentially. The method allows for the modulation of incident parallel light into structured light, enabling the recovery of both the object being measured and the real structured light wavefront.

Another notable patent is "Device and method for detecting wavefront error by modal-based optimization phase retrieval using extended Nijboer-Zernike theory." This device utilizes a point light source, a half mirror, and an image sensor to characterize wavefront errors using Zernike polynomials. The invention allows for accurate wavefront error retrieval, overcoming challenges related to exposure and signal-to-noise ratio.

Career Highlights

Binjie Lu is affiliated with Zhejiang University, where he continues to advance research in optical technologies. His work is recognized for its practical applications in improving optical component measurements.

Collaborations

He collaborates with notable colleagues such as Jian Bai and Lei Zhao, contributing to a dynamic research environment that fosters innovation.

Conclusion

Binjie Lu's contributions to wavefront reconstruction and error detection represent significant advancements in optical engineering. His innovative patents reflect a commitment to enhancing measurement techniques in the field.