This inventor holds 3 USPTO granted patents. Top assignee: Holtek Microelectronics Inc.. Active years: 1997-1998.
Location History:
- Taipei, TW (1997 - 1998)
- Chungho, TW (1998)
Company Filing History:
Years Active: 1997-1998
Title: Innovations of Inventor Bing-Yau Lu
Introduction
Bing-Yau Lu is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of integrated circuit fabrication. With a total of 3 patents to his name, his work has been instrumental in advancing technology in this area.
Latest Patents
One of his latest patents is the "Fabrication of zero layer mask." This method discloses a universal zero layer photomask for integrated circuits, which reduces production costs by requiring only one mask for all products. The alignment marks and vernier patterns are strategically placed near the edge of the effective exposure field, occupying a minimal area of the wafer. This innovative layout allows for precise alignment during the manufacturing process.
Another notable patent is the "High step process for manufacturing alignment marks for twin-well." This method involves creating high step alignment marks on a twin-well integrated circuit. It utilizes a lithography technique to form an alignment mark photoresist pattern, which is then used to etch a nitride alignment pattern. The process also includes the formation of N-well and P-well regions, enhancing the efficiency of integrated circuit production.
Career Highlights
Bing-Yau Lu is currently associated with Holtek Microelectronics Inc., where he continues to innovate and contribute to the field of microelectronics. His expertise in integrated circuit design and fabrication has made him a valuable asset to the company.
Conclusion
Bing-Yau Lu's contributions to the field of integrated circuits through his innovative patents demonstrate his commitment to advancing technology. His work not only enhances production efficiency but also paves the way for future developments in microelectronics.