This inventor holds 1 USPTO granted patent and 3 published patent applications. Top assignee: Applied Materials, Inc.. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: Bin Yao - Innovator in Semiconductor Processing Methods
Introduction
Bin Yao is an inventor based in Santa Clara, CA (US). He is known for his contributions to semiconductor processing methods, particularly in improving the surface roughness of silicon-and-germanium-containing materials. Although he currently holds no granted patents, his innovative approaches are reflected in his latest patent applications.
Latest Patent Applications
Bin Yao's latest patent applications include:
1. **Processing Methods to Improve Etched Silicon-and-Germanium-Containing Material Surface Roughness** - This application describes exemplary semiconductor processing methods that involve providing a pre-treatment precursor to a remote plasma system in a semiconductor processing chamber. The methods include generating plasma effluents of the pre-treatment precursor and flowing them to the processing region. A substrate with alternating layers of silicon-and-germanium-containing material is treated with these plasma effluents, followed by etching the material.
2. **Treatments to Improve Etched Silicon-and-Germanium-Containing Material Surface Roughness** - This application outlines methods that involve providing a treatment precursor to a remote plasma system. Similar to the previous application, it includes generating plasma effluents and flowing them to the processing region. The substrate is contacted with these effluents to remove residues from the surface of the silicon-and-germanium-containing material.
Conclusion
Bin Yao's work in semiconductor processing methods showcases his innovative spirit and dedication to improving material quality in the industry. His latest patent applications reflect significant advancements in the field, even in the absence of granted patents.