Nirasaki, Japan

Bin Wang


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2007

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1 patent (USPTO):Explore Patents

Title: **Bin Wang: Innovator in Plasma Processing Techniques**

Introduction

Bin Wang, an accomplished inventor based in Nirasaki, Japan, has significantly contributed to the field of plasma processing through his innovative methods and technological insights. With a focus on enhancing the efficiency of plasma processing techniques, Wang has developed solutions that address key challenges in the industry.

Latest Patents

Wang holds a patent for a comprehensive invention titled "Plasma processing method, detecting method of completion of seasoning, plasma processing apparatus and storage medium." This invention tackles a significant problem in the field: accurately detecting the completion of seasoning in a plasma processing environment. The method involves the creation of a predictive formula derived from multivariate analysis of various measured data obtained from dummy wafers. This predictive approach enhances the reliability of determining whether the seasoning has been completed based on specific conditions within the processing container.

Career Highlights

Bin Wang is associated with Tokyo Electron Limited, a prominent company specializing in semiconductor and flat panel display manufacturing equipment. His role in advancing plasma processing methods positions him as a valuable asset in the company's research and development team. With one patent to his name, Wang proves his capability in innovating complex solutions that address industry concerns.

Collaborations

Throughout his career, Wang has collaborated with talented individuals such as Naoki Takayama and Satoshi Harada. These partnerships enhance the collaborative effort in tackling technical challenges and driving innovation within the plasma processing sector.

Conclusion

Bin Wang's work in plasma processing not only showcases his inventive capabilities but also highlights the crucial role of innovation in advancing technology. His patent represents a significant step forward in understanding and optimizing plasma processing methods, making a lasting impact in the field. As he continues to work with Tokyo Electron Limited and alongside skilled colleagues, the future of plasma processing looks promising.

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