This inventor holds 1 USPTO granted patent. Top assignees: Boe Technology Group Co., Ltd., Hefei Boe Optoelectronics Technology Co., Ltd.. Active years: 2018.
Company Filing History:
1 out of 18,296 
1 out of 815 
Years Active: 2018
Title: The Innovations of Bin Nie
Introduction
Bin Nie is an accomplished inventor based in Beijing, China. He has made significant contributions to the field of technology, particularly in the area of overlay keys and measurement accuracy. His innovative work has led to the development of a unique patent that showcases his expertise and creativity.
Latest Patents
Bin Nie holds a patent for an "Overlay key, method of forming the same, and method of measuring overlay accuracy." This patent includes embodiments that disclose an overlay key featuring at least two overlay marks. Each mark has a first sub-mark and a second sub-mark that are centro-symmetrical to each other. The sub-marks consist of two bar patterns that are perpendicular to each other and share a common end. Additionally, at least two of the overlay marks are positioned in different layers. The patent also outlines methods for forming the overlay key and measuring overlay accuracy.
Career Highlights
Throughout his career, Bin Nie has worked with notable companies such as BOE Technology Group Co., Ltd. and Hefei BOE Optoelectronics Technology Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to various technological advancements.
Collaborations
Bin Nie has collaborated with talented individuals in his field, including Hao Yue and Yuhu Zhang. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.
Conclusion
Bin Nie's contributions to the field of technology through his patent and collaborations highlight his role as a significant inventor. His work continues to influence advancements in overlay key technology and measurement accuracy.