Hangzhou, China

Bin Lin

This inventor holds 3 USPTO granted patents and 3 published patent applications. Top assignees: Applied Materials, Inc., National Engineering Research Center for Optical Instrumentation. Active years: 2018-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bin Lin. Retrieved from https://idiyas.com/inventor/bin-lin-hk51csqx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3 

% Patents Active = 66.7

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018-2025

Loading Chart...
3 patents (USPTO):Explore Patents

Title: The Innovations of Bin Lin

Introduction

Bin Lin is a notable inventor based in Hangzhou, China. He has made significant contributions to the field of optical instrumentation, holding 3 patents that showcase his innovative approach to image processing and optical systems. His work has implications in various applications, enhancing the capabilities of imaging tools and optical guides.

Latest Patents

One of Bin Lin's latest patents is titled "Optimization-based image processing for metrology." This invention involves acquiring one or more images of a device feature using an imaging tool. A geometrical shape is defined to encompass the relevant pixels of each image, represented in terms of one or more parameters. A cost function is defined with variables comprising these parameters. Numerical optimization is applied to obtain optimal values for which the cost function is minimized, and these values are reported as metrology data pertaining to the device feature.

Another significant patent is the "Spectrum-generation system based on multiple-diffraction optical phasometry." This system features an optical guide with at least two diffraction gratings in serial in front of a light source. The first diffraction grating splits the light beam into several parallel light beams along a first axis, while the second grating further splits these beams into several points of light along a second axis. By rotating the diffraction gratings and adjusting the distance between them, users can modify the angle and relative distance of the points of light for various applications.

Career Highlights

Throughout his career, Bin Lin has worked with the National Engineering Research Center for Optical Instrumentation and Applied Materials, Inc. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in optical technology.

Collaborations

Bin Lin has collaborated with notable individuals in his field, including Xiangqun Cao and Jian Bai. These partnerships have likely fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Bin Lin's contributions to optical instrumentation and image processing demonstrate his innovative spirit and commitment to advancing technology. His patents reflect a deep understanding of complex systems and a desire to improve the functionality of optical devices.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…