Leuven, Belgium

Bin Guo

This inventor holds 1 USPTO granted patent and 1 published patent application and 1 EPO patent. Top assignees: Imec Vzw, Katholieke Universiteit Leuven. Active years: 2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bin Guo. Retrieved from https://idiyas.com/inventor/bin-guo-h3minl59

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2013

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Bin Guo

Introduction

Bin Guo is a notable inventor based in Leuven, Belgium. He has made significant contributions to the field of semiconductor manufacturing. His work has led to advancements that enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents

Bin Guo holds a patent for a method of manufacturing a semiconductor device. This patent describes a process that includes providing a substrate with a non-flat topography. The method involves forming a first capping layer over the main surface, which introduces local defects suitable for allowing a predetermined fluid to pass through. This innovation is crucial for the development of associated membrane layers, capping layers, and microelectronic devices.

Career Highlights

Throughout his career, Bin Guo has worked with prominent organizations such as Imec and Katholieke Universiteit Leuven. His role at these institutions has allowed him to contribute to cutting-edge research and development in semiconductor technology.

Collaborations

Bin Guo has collaborated with esteemed colleagues, including Ann Witvrouw and Luc Haspeslagh. These partnerships have fostered a collaborative environment that promotes innovation and the sharing of ideas.

Conclusion

Bin Guo's contributions to semiconductor manufacturing exemplify the impact of innovative thinking in technology. His patent and collaborations highlight the importance of teamwork in advancing scientific research.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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