Beijing, China

Bin Deng

This inventor holds 1 USPTO granted patent. Top assignee: Beijing Naura Microelectronics Equipment Co., Ltd.. Active years: 2021.


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2021

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1 patent (USPTO):Explore Patents

Title: The Innovations of Bin Deng

Introduction

Bin Deng is a notable inventor based in Beijing, China. He has made significant contributions to the field of microelectronics through his innovative approaches and patented technologies. His work focuses on enhancing the efficiency and productivity of semiconductor manufacturing processes.

Latest Patents

Bin Deng holds a patent for an "Annealing method, process chamber and annealing apparatus." This method involves maintaining a pressure in the process chamber at a threshold before and after a wafer is transferred into the chamber and during the annealing process. This innovation not only avoids temperature fluctuations caused by turbulent gas flow but also shortens the recovery and stabilization time of the chamber's temperature, thereby improving equipment productivity. He has 1 patent to his name.

Career Highlights

Bin Deng is currently employed at Beijing Naura Microelectronics Equipment Co., Ltd. His role at the company allows him to apply his expertise in microelectronics and contribute to advancements in the industry. His innovative methods have the potential to significantly impact semiconductor manufacturing.

Collaborations

Some of his coworkers include Zhimin Bai and Qiang Li. Their collaboration fosters a creative environment that encourages the development of new technologies and solutions in the field.

Conclusion

Bin Deng's contributions to microelectronics through his patented innovations demonstrate his commitment to improving manufacturing processes. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
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