Peekskill, NY, United States of America

Bijan Davari

This inventor holds 1 USPTO granted patent. Top assignee: United States of America as Represented by the Secretary of the Air Force. Active years: 1986.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bijan Davari. Retrieved from https://idiyas.com/inventor/bijan-davari-666fcdi4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1986

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1 patent (USPTO):Explore Patents

Title: The Innovations of Bijan Davari

Introduction

Bijan Davari is a notable inventor based in Peekskill, NY (US). He has made significant contributions to the field of semiconductor technology. His work focuses on enhancing the capabilities of electrochemical pattern generation.

Latest Patents

Bijan Davari holds a patent for the "Selective anodic oxidation of semiconductors for pattern generation." This invention describes an apparatus and method for selectively controlling anodic oxide growth on semiconductors. It incorporates the use of a writing beam of a wavelength that encourages oxide growth and a bias beam at a wavelength that discourages oxide growth. The bias beam is projected onto the semiconductor in an electrolytic environment to prevent or retard oxide growth, while oxide growth is accelerated at points of illumination by means of the writing beam. This innovative approach allows for precise control in semiconductor manufacturing.

Career Highlights

Bijan Davari is currently associated with the United States of America as represented by the Secretary of the Air Force. His work in this capacity has allowed him to contribute to advancements in technology that support national interests.

Collaborations

Bijan has collaborated with Pankaj K Das, further enhancing the scope and impact of his inventions.

Conclusion

Bijan Davari's innovative work in semiconductor technology exemplifies the importance of precision in modern manufacturing processes. His contributions continue to influence the field significantly.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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