Hsinchu, Taiwan

Bii Junq Chang

This inventor holds 2 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2000-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bii Junq Chang. Retrieved from https://idiyas.com/inventor/bii-junq-chang-x690w1s5

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 1

Forward Citations = 20(Granted Patents)


Location History:

  • Hsin-Chu Hsien, TW (2000)
  • Hsin-Chu, TW (2003)

Company Filing History:


Years Active: 2000-2003

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2 patents (USPTO):Explore Patents

Title: Innovations of Bii Junq Chang

Introduction

Bii Junq Chang is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patents. With a total of 2 patents, Chang continues to push the boundaries of what is possible in his industry.

Latest Patents

One of Chang's latest patents is a method for forming micro lens structures. This invention features a unique approach to creating micro lens arrays on light-sensitive or light-emitting semiconductor structures. A distinctive oxygen plasma etch "descum" step is performed prior to the lens reflow hardbake. Additionally, a photo-sensitive planarization layer is placed immediately atop a color filter layer, resulting in fewer process steps. The micro lens array formed through this method has a minimal number of merged or collapsed lenses, and residue on bond pad areas is significantly reduced.

Another significant patent by Chang is a photoresist supply system with air venting. This system is designed for pumping resist to a wafer coating machine and includes a line that returns a selected proportion of the resist entering the resist pump to the resist supply tank. The return line to the tank is connected to the pump outlet at a higher point than the pump outlet to the wafer coating machine. The resist that is returned to the tank carries substantially all of the bubbles that are present in the resist entering the tank. This innovative design allows for the removal of bubbles from the resist in the tank, enabling the resist to be used normally.

Career Highlights

Bii Junq Chang works at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work has been instrumental in advancing technologies that are crucial for modern electronics.

Collaborations

Chang collaborates with talented individuals such as Hao Wei Chang and Yu-Kung Hsiao, who contribute to the innovative environment at their workplace.

Conclusion

Bii Junq Chang's contributions to semiconductor technology through his patents demonstrate his commitment to innovation. His work not only enhances the efficiency of semiconductor processes but also sets a standard for future advancements in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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