New Brunswick, NJ, United States of America

Bhaskar Mitra

This inventor holds 1 USPTO granted patent. Top assignee: Picocal, Inc. Active years: 2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bhaskar Mitra. Retrieved from https://idiyas.com/inventor/bhaskar-mitra-4yyw7g7t

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2012

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1 patent (USPTO):Explore Patents

Title: Bhaskar Mitra: Innovator in Carbon Nanotube Growth

Introduction

Bhaskar Mitra is a notable inventor based in New Brunswick, NJ, specializing in advanced methods for carbon nanotube (CNT) growth. His innovative approach has the potential to significantly impact various fields, including nanotechnology and materials science.

Latest Patents

Mitra holds a patent for a method titled "Scanning Probe Assisted Localized CNT Growth." This invention presents a technique for localized chemical vapor deposition (CVD) that enables the growth of carbon nanotubes, nanowires, and oxidation using a heated tip or an array of heated tips. The method allows for controlled synthesis and direction of material growth, eliminating the need for masks, which is a significant advancement in the field.

Career Highlights

Throughout his career, Bhaskar Mitra has made substantial contributions to the field of nanotechnology. His work at Picocal, Inc. has positioned him as a key player in the development of innovative materials and techniques. His expertise in localized growth methods has garnered attention and respect within the scientific community.

Collaborations

Mitra collaborates with talented individuals such as Angelo Gaitas and Amar Sarbbasesh Basu. These partnerships enhance the research and development efforts at Picocal, Inc., fostering an environment of innovation and creativity.

Conclusion

In summary, Bhaskar Mitra is a pioneering

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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