The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2012
Filed:
May. 11, 2009
Angelo Gaitas, Ann Arbor, MI (US);
Bhaskar Mitra, New Brunswick, NJ (US);
Amar Basu, Novi, MI (US);
Weibin Zhu, Ann Arbor, MI (US);
Angelo Gaitas, Ann Arbor, MI (US);
Bhaskar Mitra, New Brunswick, NJ (US);
Amar Basu, Novi, MI (US);
Weibin Zhu, Ann Arbor, MI (US);
Picocal, Inc, Ann Arbor, MI (US);
Abstract
The present invention is a method for localized chemical vapor deposition (CVD) for localized growing for example for carbon nanotubes (CNT), nanowires, and oxidation using a heated tip or an array of heated tips to locally heat the area of interest. As the tips moved, material such as CNTs grows in the direction of movement. The Scanning Probe Growth (SPG) or nanoCVD technique has similarities to the CVD growth; however it allows for controlled synthesis and direction and eliminates the need for masks.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile