Location History:
- Herten, NL (2007)
- Eindhoven, NL (2012)
Company Filing History:
Years Active: 2007-2012
Title: Innovator Spotlight: Bertus Johan Vleeming
Introduction
Bertus Johan Vleeming is a talented inventor based in Eindhoven, NL, known for his contributions to the field of lithographic processes. With a total of 2 patents under his belt, Vleeming has made significant advancements in the design and manufacturing methods within the technology sector.
Latest Patents
1. Method of Designing Sets of Mask Patterns: Vleeming's innovative method involves compensating for scattering effects in a multiple-exposure lithographic process. By making localized adjustments to mask patterns, he ensures the accuracy and quality of the final product.
2. Method of Imaging Using Lithographic Projection Apparatus: Vleeming's method focuses on compensating for the effects of flare in lithographic apparatus. By establishing a modulation transfer function (MTF), he effectively addresses the impact of flare on critical dimensions, enhancing the overall imaging process.
Career Highlights
Vleeming is associated with ASML Netherlands B.V., a prominent company specializing in lithography equipment. His expertise and dedication to innovation have significantly contributed to the company's success in the industry. Vleeming's work reflects a deep understanding of lithographic processes and a commitment to pushing the boundaries of technology.
Collaborations
Throughout his career, Vleeming has collaborated with accomplished professionals in the field, including Richard Joseph Bruls and Marcel Johannes Louis Marie Demarteau. These collaborations have led to the development of cutting-edge solutions and further elevated Vleeming's reputation as a skilled inventor.
Conclusion
In conclusion, Bertus Johan Vleeming stands out as a man of remarkable innovation and ingenuity in the realm of lithographic processes. His patents and collaborations highlight his dedication to advancing technology and his pivotal role in shaping the future of the industry. Vleeming's contributions continue to inspire and pave the way for further developments in the field.