The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2007
Filed:
Dec. 21, 2004
Richard Joseph Bruls, Eindhoven, NL;
Marcel Johannes Louis Marie Demarteau, Herten, NL;
Bertus Johan Vleeming, Herten, NL;
Thomas Leo Maria Hoogenboom, Breda, NL;
Richard Joseph Bruls, Eindhoven, NL;
Marcel Johannes Louis Marie Demarteau, Herten, NL;
Bertus Johan Vleeming, Herten, NL;
Thomas Leo Maria Hoogenboom, Breda, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method is provided for compensating for the effect of flare lithographic apparatus. The method includes establishing a power spectral density (PSD) indicative of the spatial frequency of the stray radiation produced by a projection system, and determining, from the PSD, a modulation transfer function (MTF) relating the PSD to a pattern applied by a patterning device to take the effect of flare on the pattern image into account. The MTF is then used to determine the effect of flare on a critical dimension (CD) of the pattern image, and a relationship is established between any change in the CD of the pattern image and a change in the CD of the pattern. The patterning device may then be designed in such a way as to at least partially offset the effect of flare on the CD of the pattern image.