This inventor holds 1 USPTO granted patent. Top assignee: Az Electronic Materials (Luxembourg) S.a.r.l.. Active years: 2017.
Company Filing History:
Years Active: 2017
Title: Bertram Bernd Barnickel: Innovator in Silica Film Technology
Introduction
Bertram Bernd Barnickel is a notable inventor based in Kakegawa, Japan. He has made significant contributions to the field of materials science, particularly in the development of innovative compositions for forming silica films.
Latest Patents
Barnickel holds a patent for "Perhydropolysilazane, composition containing same, and method for forming silica film using same." This invention addresses the challenge of creating a siliceous film with minimal defects. The perhydropolysilazane described in his patent has a weight-average molecular weight ranging from 5,000 to 17,000. It is characterized by specific ratios of SiH and NH based on the aromatic ring hydrogen content of xylol, ensuring high-quality film formation.
Career Highlights
Barnickel is associated with Az Electronic Materials (Luxembourg) S.a.r.l., where he has been instrumental in advancing research and development in electronic materials. His work focuses on enhancing the properties of materials used in various applications, particularly in the electronics industry.
Collaborations
Throughout his career, Barnickel has collaborated with esteemed colleagues such as Hiroyuki Aoki and Toshiya Okamura. These partnerships have fostered innovation and contributed to the successful development of new technologies.
Conclusion
Bertram Bernd Barnickel's contributions to the field of silica film technology exemplify his commitment to innovation and excellence. His patent and collaborative efforts continue to influence advancements in materials science.