Bernhard Cordts

Title: The Innovations of Bernhard Cordts

Introduction

Bernhard Cordts is a notable inventor based in Ipswich, Massachusetts. He has made significant contributions to the field of ion implantation technology, particularly in the production of silicon wafers. With a total of two patents to his name, Cordts has demonstrated a commitment to advancing semiconductor manufacturing processes.

Latest Patents

Cordts's latest patents focus on the innovative use of controlled water vapor in ion implantation systems. One of his key inventions is an ion implantation system designed to produce silicon wafers with relatively low defect densities, specifically below about 1×10/cm. This system includes a fluid port in the ion implantation chamber that allows for the introduction of a background gas, such as water vapor, during the ion implantation process. The introduction of this gas significantly reduces the defect density of the top silicon layer, which is separated from the buried silicon dioxide layer.

Career Highlights

Throughout his career, Bernhard Cordts has been associated with Ibis Technology Corporation, where he has played a crucial role in developing advanced technologies for semiconductor manufacturing. His work has contributed to improving the quality and efficiency of silicon wafer production.

Collaborations

Cordts has collaborated with notable colleagues, including Robert Dolan and Marvin Farley, who have also contributed to advancements in the field of ion implantation technology.

Conclusion

Bernhard Cordts's innovative work in ion implantation technology has made a significant impact on the semiconductor industry. His patents reflect a deep understanding of the complexities involved in silicon wafer production, and his contributions continue to influence the field.