Hamburg, Germany

Bernd Matthiesen

This inventor holds 1 USPTO granted patent. Top assignee: U.S. Philips Corporation. Active years: 1991.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bernd Matthiesen. Retrieved from https://idiyas.com/inventor/bernd-matthiesen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 1991

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Bernd Matthiesen in Radiation Lithography

Introduction

Bernd Matthiesen, a dedicated inventor based in Hamburg, Germany, has made significant strides in the field of manufacturing mask supports for radiation lithography. His innovative approach addresses critical challenges in the production of high-quality lithography masks, which are essential in the microfabrication of electronic devices.

Latest Patents

Matthiesen holds a single patent titled "Method of manufacturing a mask support of SiC for radiation lithography." This patent outlines a novel process for creating a mask support, or diaphragm, made from silicon carbide (SiC). The method involves depositing an SiC layer on one of the major surfaces of a silicon single crystal wafer, followed by removing the wafer selectively, leaving only an edge region intact. Additionally, the mask support undergoes an annealing process in an oxidizing atmosphere at varying temperatures, ensuring enhanced quality and performance.

Career Highlights

Currently employed by U.S. Philips Corporation, Matthiesen has showcased his skills and expertise in advancing lithography technologies. His work contributes to the relentless pursuit of refining manufacturing processes, ultimately benefiting the broader electronics industry.

Collaborations

Throughout his career, Matthiesen has collaborated with notable colleagues such as Margret Harms and Holger K Luthje. These partnerships highlight the collaborative spirit in the research and development environment at U.S. Philips Corporation, fostering innovation through shared expertise and insights.

Conclusion

Bernd Matthiesen's contributions to the invention of SiC mask supports for radiation lithography reflect his commitment to innovation in the field. His patent underscores the importance of continuous advancement in manufacturing techniques, paving the way for more efficient and effective production methods in electronic device fabrication. As the industry evolves, inventors like Matthiesen play a crucial role in driving technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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