Company Filing History:
3 out of 1,194 
2 out of 6,662 
Years Active: 1989-1993
Title: Bernd Hupfer: Innovator in High-Temperature Polyamides
Introduction
Bernd Hupfer is a notable inventor based in North Kingstown, Rhode Island. He has made significant contributions to the field of high-temperature polyamides, holding a total of 5 patents. His work has advanced the development of materials suitable for microelectronics and printing applications.
Latest Patents
One of Hupfer's latest patents involves polyamides containing the hexafluoroisopropylidene group. This invention focuses on high-temperature polyamides that, when combined with photo or radiation sensitizers, yield improved high-temperature positive resists. These resists can be developed in aqueous alkaline developers and thermally annealed to create heat-resistant polyoxazole relief structures. Such structures are particularly useful in microelectronic and printing applications. The positive photoresists he developed exhibit enhanced solubility in coating solvents and improved photospeed. The polyamides can be synthesized through conventional condensation reactions, such as the reaction between a diamine and diacid chloride. Additionally, these polyamides offer high-temperature protective coatings with superior adhesion properties beyond the photoresist area.
Another significant patent describes a photopolymerizable mixture for producing relief structures made of highly heat-resistant polymers. This mixture consists of a soluble prepolymer with photosensitive radicals bound to carboxyl groups, monomers, and a photoinitiator. The photoinitiator contains at least one trihalomethyl group that reacts upon exposure to light. This innovation allows for the creation of sharp-edged resist images with a resolution of less than 3 micrometers, even with exposure times significantly shorter than those required for conventional mixtures.
Career Highlights
Throughout his career, Bernd Hupfer has worked with prominent companies, including Hoechst Celanese Corporation and Hoechst Aktiengesellschaft. His experience in these organizations has contributed to his expertise in polymer chemistry and materials science.
Collaborations
Hupfer has collaborated with notable professionals in his field, including Werner H. Mueller and Dinesh N. Khanna. These collaborations have likely enriched his research and development efforts.
Conclusion
Bernd Hupfer's innovative work in high-temperature polyamides and photopolymerizable mixtures has made a significant impact on the fields of microelectronics and printing