Bernard Fay

Title: The Innovations of Bernard Fay

Introduction

Bernard Fay is a notable inventor based in Sarasota, FL (US). He has made significant contributions to the field of metrology, particularly in the area of lithographic exposures. With a total of 3 patents to his name, Fay's work has had a considerable impact on the industry.

Latest Patents

One of Bernard Fay's latest patents is an automated overlay metrology system. This system allows for non-imaging measurement of misalignment in lithographic exposures. It works by illuminating periodic features of a mark formed by two lithographic exposures with broadband light. The system detects an interference pattern at different wavelengths using a specular spectroscopic scatterometer that includes a wavelength dispersive detector. Misalignment can be discriminated by inspecting a spectral response curve and comparing it with stored spectral response curves, which may consist of empirical data or derived simulations. The determination of the best fit to a stored spectral curve, preferably using an optimization technique, can quantify the detected misalignment. This measurement can be performed online or in-line in a short time while avoiding tool-induced shifts, contact with the mark, or the use of a tool requiring high vacuum.

Career Highlights

Bernard Fay is currently employed at Nikon Corporation, where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of metrology systems used in lithography.

Collaborations

Fay has collaborated with several talented individuals, including Arun A Aiver and Arun Ananth Aiyer. These collaborations have further enriched his work and contributed to the success of his projects.

Conclusion

Bernard Fay's contributions to the field of metrology and lithography are noteworthy. His innovative patents and collaborations highlight his commitment to advancing technology in this critical area.