This inventor holds 1 USPTO granted patent. Top assignee: Commissariat a L'energie Atomique Et Aux Energies Alternatives. Active years: 1991.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1991
Title: Bernard Bouyer: Innovator in Plasma Reactor Technology
Introduction
Bernard Bouyer is a notable inventor based in Grenoble, France. He has made significant contributions to the field of plasma reactor technology, particularly through his innovative patent.
Latest Patents
Bernard Bouyer holds a patent for a "Process and apparatus for determining the impedance of the discharge in a plasma reactor system." This invention describes a method and apparatus that includes a tuning box with variable capacitors. The impedance of the discharge is determined based on a pre-established relationship between the operational positions of the variable capacitors and the impedance of the discharge. Additionally, the ionic current relative to the discharge in the reactor can be determined by considering the high-frequency voltage of the reactor. This patent showcases his expertise in enhancing the efficiency and functionality of plasma reactors.
Career Highlights
Bernard Bouyer is associated with the Commissariat à l'énergie atomique et aux énergies alternatives, a prominent research institution in France. His work there has focused on advancing technologies related to energy and plasma systems. With a patent count of 1 patent, he has established himself as a key figure in his field.
Collaborations
Throughout his career, Bernard Bouyer has collaborated with notable colleagues, including Bernard Andries and Guillaume Ravel. These partnerships have contributed to the development of innovative solutions in plasma technology.
Conclusion
Bernard Bouyer's contributions to plasma reactor technology through his patent demonstrate his innovative spirit and commitment to advancing scientific knowledge. His work continues to influence the field and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
