Beom-yong Hwang

Title: Beom-yong Hwang: Innovator in Semiconductor Technology

Introduction

Beom-yong Hwang is a prominent inventor based in Seoul, South Korea. He is known for his contributions to semiconductor technology, particularly in the design and functionality of semiconductor devices. His innovative work has led to advancements that are crucial in the electronics industry.

Latest Patents

Beom-yong Hwang holds a patent for a semiconductor device that includes a channel layer located on a substrate. This channel layer consists of a conductive oxide, with a gate structure positioned on top. The gate structure features a gate electrode and gate spacers on both sidewalls. Additionally, the device includes source and drain regions on either side of the gate structure, designed to apply tensile stress to a portion of the channel layer beneath the gate structure. This invention is significant for enhancing the performance of semiconductor devices.

Career Highlights

Beom-yong Hwang is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to be at the forefront of semiconductor innovation, contributing to the development of cutting-edge technologies that power modern electronic devices.

Collaborations

Beom-yong has collaborated with notable coworkers, including Woo-bin Song and Hei-seung Kim. Their teamwork has fostered an environment of innovation and creativity, leading to significant advancements in their field.

Conclusion

Beom-yong Hwang's contributions to semiconductor technology exemplify the impact of innovative thinking in the electronics industry. His patent and work at Samsung Electronics Co., Ltd. highlight his role as a key player in advancing technology.