Company Filing History:
Years Active: 2013-2017
Title: Innovations by Inventor Benson Wang
Introduction
Benson Wang is a notable inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the development of planar diodes. With a total of 3 patents to his name, Wang continues to push the boundaries of innovation in his industry.
Latest Patents
One of his latest patents is titled "Process for forming a planar diode using one mask." This invention describes a method for creating a planar diode by coating a substrate with an oxide layer. A central portion of the oxide is removed to define a window for dopant diffusion. The substrate is then plated with Ni/Au to provide ohmic contact surfaces. Additionally, the oxide surrounding the window is coated with a polyimide passivating agent that covers the P/N junction.
Career Highlights
Benson Wang is currently employed at Vishay General Semiconductor, Inc., where he applies his expertise in semiconductor manufacturing. His work has been instrumental in advancing the technology used in diodes, which are critical components in various electronic devices.
Collaborations
Wang collaborates with talented coworkers, including Kevin Lu and Warren Chiang. Their combined efforts contribute to the innovative projects at Vishay General Semiconductor, Inc.
Conclusion
Benson Wang's contributions to semiconductor technology through his patents and work at Vishay General Semiconductor, Inc. highlight his role as a key innovator in the field. His latest advancements in planar diode technology demonstrate his commitment to pushing the boundaries of electronic innovation.