Company Filing History:
Years Active: 2024-2025
Title: The Innovative Contributions of Benoit Herve Gaury
Introduction
Benoit Herve Gaury is a notable inventor based in Eindhoven, Netherlands. He has made significant contributions to the field of lithography, particularly in the design and assessment of marks used in lithographic processes. With a total of 3 patents, Gaury continues to push the boundaries of innovation in his field.
Latest Patents
Gaury's latest patents include a method for designing a mark to be projected on an object during a lithographic process. This invention involves a non-transitory computer-readable medium that stores instructions for operations aimed at designing a mark for assessing lithographic processes. The operations include determining an overlay step that represents differences between various overlay distances of different configurations for the mark design. The mark consists of a first layer and a second layer, both of which are projected onto each other during the lithographic process.
Another significant patent focuses on optically determining electrical contact between metallic features in different layers of a structure. This invention addresses the challenges posed when metallic features consist of different metals or dimensions, which can lead to resonances in reflected radiation. Gaury's method allows for the determination of whether these metallic features are in contact based on the spectral positions of the resonances detected.
Career Highlights
Benoit Herve Gaury is currently employed at ASML Netherlands B.V., a leading company in the field of lithography and semiconductor manufacturing. His work at ASML has positioned him at the forefront of technological advancements in the industry.
Collaborations
Gaury collaborates with Shakeeb Bin Hasan, contributing to innovative projects and research within the company. Their partnership exemplifies the collaborative spirit that drives progress in technological development.
Conclusion
Benoit Herve Gaury is a distinguished inventor whose work in lithography has led to significant advancements in the field. His innovative patents and contributions continue to shape the future of semiconductor manufacturing.