The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2025
Filed:
Mar. 17, 2023
Asml Netherlands B.v., Veldhoven, NL;
Benoit Herve Gaury, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A non-transitory computer-readable medium stores a set of instructions for performing operations to design a mark for assessing a lithographic process. The operations include determining an overlay step that represents a difference between different overlay distances of the different overlay configurations for a design of the mark. The mark includes a first layer mark with first layer components and a second layer mark with second layer components. The first layer mark and the second layer mark are to be projected onto each other via the lithographic process. Each overlay configuration has different overlay distance at which each first layer component is arranged in a first direction of an associated second layer component of the second layer components. The operations include determining a largest overlay distance. The operations also include determining a number of first layer components and/or a number of associated second layer components in each overlay configuration.