Benoît Bataillou

Title: Benoît Bataillou: Innovator in Semiconductor Technology

Introduction

Benoît Bataillou is a notable inventor based in Grenoble, France. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods of producing semiconductor structures. His work has implications for various applications in electronics, optoelectronics, and optics.

Latest Patents

Bataillou holds a patent for a method of producing a semiconductor structure that includes at least one support substrate and an ultrathin layer. This method involves bonding a support substrate to a source substrate, detaching a useful layer along a zone of weakness, and treating the transferred useful layer to create an ultrathin layer on the support substrate. The resulting ultrathin layer is designed to withstand heat treatments without forming defects, making it suitable for advanced applications in the semiconductor industry. He has 1 patent to his name.

Career Highlights

Throughout his career, Benoît has worked with prominent companies in the semiconductor field. He has been associated with S.O.I. Tec Silicon on Insulator Technologies and the Commissariat À L'Énergie Atomique (CEA). His experience in these organizations has allowed him to refine his expertise and contribute to groundbreaking advancements in semiconductor technology.

Collaborations

Bataillou has collaborated with several professionals in his field, including Cécile Aulnette and Bruno Ghyselen. These collaborations have further enriched his work and have led to innovative solutions in semiconductor production.

Conclusion

Benoît Bataillou is a distinguished inventor whose work in semiconductor technology has paved the way for advancements in various electronic applications. His innovative methods and collaborations highlight his significant impact on the industry.