Benny Ku

Title: The Innovative Mind of Benny Ku

Introduction

Benny Ku is an accomplished inventor based in Bielefeld, Germany. With a strong focus on advancements in extreme ultraviolet (EUV) technology, he has made significant contributions to the field through his patents. His innovative work is vital for enhancing semiconductor manufacturing processes and pushing the boundaries of technology.

Latest Patents

Benny Ku holds two notable patents that showcase his expertise:

1. **Extreme ultraviolet light reflective structure including nano-lattice and manufacturing method thereof** - This patent describes an EUV reflective structure that includes a substrate with multiple pairs of silicon and molybdenum layers. The unique aspect of this design is its multiple cavities within the silicon layer, which aim to improve the efficiency of light reflection in extreme ultraviolet applications.

2. **Extreme ultraviolet light reflective structure including nano-lattice and manufacturing method thereof** - This patent reiterates the innovative formulation of a reflective structure comprising a substrate and silicon and molybdenum layers. It highlights the crucial role of cavities in enhancing light reflection, vital for the semiconductor industry.

Career Highlights

Benny Ku is affiliated with Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leading global entity in the semiconductor industry. His role at TSMC involves researching and developing advanced manufacturing methods for creating cutting-edge semiconductor devices. Throughout his career, Benny has leveraged his knowledge to contribute to innovations that support the growth of the tech landscape.

Collaborations

Benny has collaborated with talented individuals like Keith Kuang-Kuo Koai and Wen-Hao Cheng. Together, they have worked on pioneering projects that have reinforced the foundation of semiconductor technology. Their teamwork exemplifies the spirit of innovation and collaboration that drives advancements in the field.

Conclusion

Benny Ku's contributions to the field of semiconductor technology through his patents are a testament to his inventive spirit and commitment to innovation. His work, particularly in extreme ultraviolet light reflective structures, showcases the potential for advancements in semiconductor manufacturing. As he continues to collaborate with other experts in the field, Benny is poised to make even greater strides in technology.