Bennett Robinson

Title: Bennett Robinson: Innovator in Plasma Technology

Introduction

Bennett Robinson is a notable inventor based in New York, NY (US). He has made significant contributions to the field of plasma technology, holding 2 patents that showcase his innovative approach to chemical vapor deposition (CVD) processes.

Latest Patents

Robinson's latest patents include the "Plasma CVD apparatus and processes" and the "Mixed excitation plasma etching system." The Plasma CVD apparatus focuses on producing and utilizing a novel CVD apparatus for depositing silicon layers onto suitable substrates. It also addresses the in-situ etching removal of background silicon deposits from the interior walls of the apparatus. This invention employs a fused quartz reaction chamber, with the interior wall precoated with a thin continuous barrier layer of Al.sub.2 O.sub.3, which is inert to the etching gas used for removing background silicon deposits.

The Mixed excitation plasma etching system reveals a surprising discovery: when a plasma is generated by exciting a gas or mixture of gases with both microwaves and a radio frequency electrical discharge, the resulting plasma exhibits significantly higher chemical reactivity. This innovative plasma etches surfaces much faster than the combined etch rates produced by each excitation method individually. Furthermore, the etching anisotropy can be controlled by varying the power ratio of the two types of simultaneous excitation.

Career Highlights

Bennett Robinson is currently employed at International Business Machines Corporation (IBM), where he continues to push the boundaries of plasma technology. His work has been instrumental in advancing the applications of plasma in various industrial processes.

Collaborations

Robinson has collaborated with notable coworkers, including Fletcher Jones and Kenneth J Muroski, Jr. Their combined expertise has contributed to the success of their projects and innovations.

Conclusion

Bennett Robinson's contributions to plasma technology through his patents and work at IBM highlight his role as a leading inventor in the field. His innovative approaches continue to influence advancements in chemical vapor deposition processes and plasma etching systems.