Location History:
- Dallas, TX (US) (2007)
- Chandler, AZ (US) (2010)
Company Filing History:
Years Active: 2007-2010
Title: Innovations by Inventor Benjamin Moser in Semiconductor Technology
Introduction
Benjamin Moser is a notable inventor based in Chandler, AZ, with a significant contribution to the field of semiconductor technology. With two patents to his name, his inventions demonstrate a focus on improving ion implant processes, which are crucial in the manufacturing of integrated circuits.
Latest Patents
Moser's latest patents include groundbreaking methods for semiconductor device manufacturing. The first patent involves a "Semiconductor device manufactured using a non-contact implant metrology." This innovation outlines a method of calibrating an ion implant process by forming a dielectric layer over a calibration substrate. In this method, a dopant is implanted into the dielectric layer, where charge is deposited on the surface. By measuring the voltage on the surface and determining the electrical characteristic of the dielectric layer, an accurate doping level can be established. This innovative calibration process enhances the precision of ion implantation into semiconductor substrates.
The second patent, titled "Implant optimization scheme," presents a method that addresses the implantation of ions in a substrate. This process involves placing the substrate on an implant platen such that its predominant axes are rotated between 30 to 60 degrees or 120 to 150 degrees offset from radial alignment with the implant platen. Notably, this arrangement mitigates shadowing effects during ion implantation, thus improving the overall efficiency of integrated circuit manufacturing.
Career Highlights
Benjamin Moser is currently employed at Texas Instruments Corporation, a leading company in semiconductor design and manufacturing. His role as an inventor showcases his commitment to advancing the technology that underpins many electronic devices today.
Collaborations
Throughout his career, Moser has collaborated with esteemed professionals in the field, including his coworkers Narendra Singh Mehta and Ajith Varghese. These collaborations likely enhance the innovative capabilities and technological advancements being pursued at Texas Instruments Corporation.
Conclusion
In summary, Benjamin Moser's contributions to semiconductor device manufacturing through his patents are indicative of his expertise and creativity as an inventor. By focusing on optimizing ion implantation processes, he is helping to pave the way for more efficient and effective integrated circuit manufacturing techniques. His work at Texas Instruments Corporation continues to impact the field of electronics and semiconductor technology significantly.