Shanghai, China

Benjamin Liu

This inventor holds 3 USPTO granted patents and 1 EPO patent. Top assignee: Intel Corporation. Active years: 2012-2013.


% Patents Active = 33.3


Average Co-Inventor Count = 1.3

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2012-2013

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3 patents (USPTO):Explore Patents

Title: The Innovations of Benjamin Liu

Introduction

Benjamin Liu is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of technology, particularly in virtual machine environments. With a total of 3 patents to his name, Liu's work has had a notable impact on the industry.

Latest Patents

Liu's latest patents include innovative methods and systems for managing device models in a virtual machine cluster environment. One of his patents describes how a client platform can determine that an input/output operation related to a hardware device may occur in a virtual machine. The client platform can then request a server platform via the network to handle this operation. The server platform identifies a software device from a range of software devices to manage the request, ensuring efficient operation. Another patent focuses on changing a scheduler in a virtual machine monitor. This invention allows for a second scheduler to be loaded and activated while the virtual machine monitor is running, enhancing the scheduling process.

Career Highlights

Liu is currently employed at Intel Corporation, where he continues to innovate and develop new technologies. His work at Intel has positioned him as a key player in advancing virtual machine technology.

Collaborations

Liu collaborates with talented coworkers, including Yunhong Jiang and Fei Li, who contribute to his projects and enhance the overall innovation process.

Conclusion

Benjamin Liu's contributions to technology through his patents and work at Intel Corporation highlight his role as a leading inventor in the field. His innovative approaches to virtual machine environments continue to shape the future of technology.

Profile summary based on public USPTO records.
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